Advancements in Atomic Layer Deposition Techniques for Ultra-Thin Gate Dielectrics in Nanoscale Semiconductor Devices. ISCSITR-IJET [Internet]. 2022 Mar. 26 [cited 2025 Oct. 8];3(1):8-14. Available from: https://iscsitr.in/index.php/ISCSITR-IJET/article/view/ISCSITR-IJET_03_01_002