“Advancements in Atomic Layer Deposition Techniques for Ultra-Thin Gate Dielectrics in Nanoscale Semiconductor Devices”, ISCSITR-IJET, vol. 3, no. 1, pp. 8–14, Mar. 2022, Accessed: Oct. 08, 2025. [Online]. Available: https://iscsitr.in/index.php/ISCSITR-IJET/article/view/ISCSITR-IJET_03_01_002