“Advancements in Atomic Layer Deposition Techniques for Ultra-Thin Gate Dielectrics in Nanoscale Semiconductor Devices” (2022) ISCSITR- INTERNATIONAL JOURNAL OF ENGINEERING AND TECHNOLOGY - ISSN (online): 3067-7351, 3(1), pp. 8–14. Available at: https://iscsitr.in/index.php/ISCSITR-IJET/article/view/ISCSITR-IJET_03_01_002 (Accessed: 8 October 2025).